CMP & Post-CMP
CMP slurries and cleaning chemistries.
CMP is a core focus at FabSemiChem. We support process-specific slurry and post-CMP cleaning needs from early evaluation through repeat small-batch supply.
CMP Slurries
Process-oriented formulations for polishing applications, including custom chemistry and concentration adjustment.
Polishing Chemistry
Support for abrasive systems, chemical additives, pH adjustment, and application-specific formulation work.
Post-CMP Cleaners
Cleaning chemistry support focused on residue removal and surface compatibility after polishing.
Typical support
Flexible around customer process requirements.
| Need | FabSemiChem Support |
|---|---|
| Existing formulation transfer | Customer-defined formulation, documented batch preparation, controlled repeat manufacturing |
| Concentration adjustment | Custom concentration or dilution based on process requirements |
| Evaluation batch | Small-batch preparation for lab, pilot, or qualification work |
| Process troubleshooting | Technical discussion around chemistry variables and formulation fit |
| Post-CMP cleaning | Custom cleaning chemistry and formulation support |
Specific formulations, specifications, and process compatibility are discussed under NDA when appropriate.